silicon etch rate in koh

Keyword Analysis

Keyword	CPC	PCC	Volume	Score	Length of keyword
silicon etch rate in koh	1.59	0.8	1345	98	24
silicon	0.54	0.4	5411	41	7
etch	0.46	1	5100	64	4
rate	1.48	0.5	8674	78	4
in	1.11	0.9	1775	95	2
koh	1.91	1	5465	43	3

Keyword	CPC	PCC	Volume	Score
silicon etch rate in koh	1.75	0.2	4711	21
koh etching of silicon	0.03	0.4	6987	13
koh sio2 etch rate	1.63	0.6	1090	49
koh etching of silicon 110	1.19	0.4	872	44
koh etching of silicon 111	0.76	0.5	2249	29
silicon koh etching reaction	0.48	0.8	6159	35
wet etch silicon oxide rate	1.31	0.4	2613	30
wet etch silicon dioxide rate	0.56	0.7	9582	71
single silicon + resistivity + etch rate	1.03	0.4	92	8
silicon nitride etch rate	1.31	0.8	7837	5
silicon oxynitride etch rate	0.25	0.1	8150	50
poly si etch rate	0.34	0.6	8727	27
hf sio2 etch rate	1.94	1	369	29
sio2 wet etch rate	0.97	0.5	5269	60
koh for gaas etch	1.93	0.1	6600	50
ohnishi parameter etch rate	0.31	0.4	2975	19
laser enhanced etching in koh	1.36	0.8	3849	94
high aspect ratio silicon etch	1.19	0.5	2568	47
high aspect ratio silicon etch a review	1.5	0.5	1585	68
h3po4 sio2 etch rate	0.27	0.6	6789	47
boe sio2 etch rate	0.21	0.1	8727	1
tin hf etch rate	0.4	0.1	9719	85